Publication | Closed Access
Impacts of Misalignment on 1μm Pitch Cu-Cu Hybrid Bonding
27
Citations
5
References
2020
Year
Unknown Venue
Materials ScienceMaterials EngineeringElectrical EngineeringElectromigration TechniqueUpper Cu PadEngineeringAdvanced Packaging (Semiconductors)NanoelectronicsPitch Cu-cuApplied PhysicsConnection PitchChip AttachmentElectronic PackagingMicroelectronicsMicrostructureElectrical Insulation
In this study, we have successfully demonstrated the 1μm pitch Cu-Cu hybrid bonding technology with remarkable electrical properties and reliabilities. 1μm pitch is world's finest class and is 3 times smaller than the connection pitch of our conventional Cu-Cu hybrid bonding technology. Moreover, the impacts of misalignment between upper Cu pad and lower Cu pad on contact resistance, electro-migration (EM) performance, leakage current and breakdown voltage were also investigated in such ultra-fine Cu-Cu hybrid bonding system.
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