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Field Ion-Scanning Tunneling Microscopy Study of C<sub>84</sub> on the Si(100) Surface
21
Citations
11
References
1993
Year
EngineeringMicroscopyChemistrySemiconductorsTunneling MicroscopyFullereneMonolayer/multilayer AdsorptionInitial StagePhysicsNanotechnologyChemisorptionElectronic MaterialsSurface ChemistryNatural SciencesScanning Probe MicroscopySurface ScienceApplied PhysicsSurface AnalysisC 84
Initial stage and monolayer/multilayer adsorption of C 84 fullerene on the Si(100)2×1 surface was investigated by field ion-scanning tunneling microscopy. The C 84 molecules reside stably at room temperature in the trough formed by Si dimer rows. The nearest neighbour distance of the C 84 molecules is approximately 14 Å. For the first and second layers, only the disordered adsorption geometry was observed. When C 84 was deposited while keeping the substrate at 100 to 150°C, the fcc crystal formation was observed above the third layer with its lattice constant of 17.1 Å.
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