Curvilinear data format working group for MBMW era

Abstract

Multi-beam mask writers (MBMW) offer the potential to enable the use of ideal curvilinear shapes for ILT masks, but current layout formats are not sufficient to represent complex ILT designs efficiently from OPC through mask making. In the 2019 BACUS conference, we proposed the formation of a data format working group to address the need for curvilinear data representation for MBMW. The Curvilinear data format working group was first initiated in October 2019 with participation from EDA companies and advanced mask makers. In this paper, the necessity of a new curvilinear data format and our working group will be introduced. We will discuss the progress and the plan of the working group.