Shadow Nanosphere Lithography:  Simulation and Experiment

Abstract

In this letter we describe the preparation of large-area, two-dimensional metallic structures using shadow nanosphere lithography. By varying the position of the substrate with respect to the evaporation source during the sample preparation, we make morphologies such as cups, rods, and wires, that are not accessible by the standard nanosphere lithography. This technique also allows for an encapsulation of the metallic structures, to prevent them from oxidation. Morphologies predicted by our computer simulations have been subsequently confirmed experimentally.