Publication | Closed Access
Low-temperature crystallization and paraelectric–ferroelectric phase transformation in nanoscale ZrO<sub>2</sub> thin films induced by atomic layer plasma treatment
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Citations
51
References
2020
Year
Materials ScienceMaterials EngineeringMultiferroicsEngineeringFerroelectric ApplicationNanotechnologyLow-temperature CrystallizationSurface ScienceApplied PhysicsCondensed Matter PhysicsParaelectric–ferroelectric Phase TransformationCrystal Growth TechnologyHigh EnduranceOxide ElectronicsThin Film Process TechnologyThin FilmsThin Film ProcessingLow Temperature
Crystallization and ferroelectricity with high endurance are achieved in ZrO<sub>2</sub> thin films at low temperature using an atomic layer plasma treatment technique.
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