Realizing High Refractive Index Thiol-X Materials: A General and Scalable Synthetic Approach

Marvin D. Alim, Sudheendran Mavila, David B. Miller, Sijia Huang, Maciej Podgórski, Lewis M. Cox, Amy C. Sullivan, Robert R. McLeod, Christopher N. Bowman

ACS Materials Letters · 2019 · 39 citations · 34 references

Concepts

Abstract

Photopolymers formed from the family of thiol-X “click” reactions notably form sulfur-containing thioether linkages. While sulfur-containing materials are conventionally expected to result in high refractive index (nD/20 °C > 1.6) materials, this expectation is rarely realized with thiol-X photopolymers, because of the lack of monomers with sufficiently high refractive indices. Here, an efficient, modular synthetic strategy to obtain high refractive index thiol-X monomers is presented. The efficacy of the overall approach is demonstrated using only commercially available starting compounds to yield low viscosity (<500 cP) liquid multifunctional thiol and diallyl ether monomers with high refractive indices (nD/20 °C > 1.64). These synthesized monomers underwent rapid thiol-ene photopolymerizations to high conversions, achieving refractive index values (nD/20 °C) up to 1.669 in uniform crosslinked networks exhibiting typical narrow and well-defined loss tangent (tan δ) peaks. The convenience of the low-viscosity, high optical quality thiol-ene resins was demonstrated in the fabrication of two functional optical components. First, a plano-convex lens was aspherized using an overmolding procedure. Second, a two-dimensional grating was fabricated using a two-stage material and a photomask exposure.

References

34