Publication | Closed Access
Ferroelectricity of HfxZr1−xO2 thin films fabricated by 300 °C low temperature process with plasma-enhanced atomic layer deposition
73
Citations
44
References
2019
Year
Materials ScienceMultiferroicsEngineeringFerroelectric ApplicationHfxzr1−xo2 Thin FilmsSurface ScienceApplied PhysicsThin Film Process TechnologyThin FilmsFunctional MaterialsThin Film Processing
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