Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O2 plasma treatment - Concepedia

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Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O2 plasma treatment

DOI Full Paper Access

28

Citations

28

References

2018

Year

Stefan Knobelspies, Alain Yuji Takabayashi, Alwin Daus, Giuseppe Cantarella, Niko Münzenrieder, Gerhard Tröster

Solid-State Electronics

Materials ScienceElectrical EngineeringEngineeringFlexible ElectronicsMicrofabricationCf4/o2 Plasma TreatmentApplied PhysicsPlasma ProcessingThin Film ProcessingContact Resistance

References

	Year	Citations

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