Publication | Closed Access
Advanced and reliable GaAs/AlGaAs ICP-DRIE etching for optoelectronic, microelectronic and microsystem applications
25
Citations
28
References
2018
Year
Electrical EngineeringOptical MaterialsEngineeringWafer Scale ProcessingMicrofabricationApplied PhysicsReliable Gaas/algaas Icp-drieSemiconductor Device FabricationMicrosystem ApplicationsElectronic PackagingMicroelectronicsPlasma EtchingOptoelectronicsCompound Semiconductor
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