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Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties

Materials ScienceAluminium NitrideStructural PropertiesEngineeringSurface ScienceApplied PhysicsDioxygen PrecursorsThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing