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A resistive switching memory device with a negative differential resistance at room temperature
52
Citations
39
References
2018
Year
Non-volatile MemoryEngineeringLarge-area Zno NanorodMetallic NanomaterialsPhase Change MemoryElectronic DevicesNanoengineeringNanoelectronicsMemory DeviceMemory DevicesNegative Differential ResistanceMaterials ScienceElectrical EngineeringNanotechnologySurface ElectrochemistryOxide ElectronicsElectrochemical ProcessMicroelectronicsRoom TemperatureZn FoilElectronic MaterialsNanomaterialsApplied PhysicsResistive Random-access MemoryZn Foil SubstrateElectrochemical Surface Science
In this study, large-area ZnO nanorod arrays covering a Zn foil substrate were produced by a low-cost and low temperature approach. In this approach, oxidation of zinc metal was achieved in a formamide/water mixture. Taking advantage of the product, a sandwiched structure, Ag/ZnO/Zn, was fabricated in which Ag acts as the top electrode, ZnO as the active layer and Zn foil as the bottom electrode. Resistive switching memory behavior (with an HRS/LRS resistance ratio of ∼10) along with a negative differential resistance effect (the largest slope being −3.85) was synchronously observed for this device at room temperature. This device opens up possibilities for multifunctional components in future electronic applications.
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