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Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Materials ScienceMolecular OxidationEngineeringSurface ChemistryOxidation ResistanceSurface ScienceCatalysisChemistryChemical DepositionSurface –Ch3Surface ProcessingSurface ReactivityAtomic Layer Deposition