Growth of<i>β</i>-Ga₂O₃Films on Sapphire by Hydride Vapor Phase Epitaxy

Abstract

Two-inch Ga2O3 films with ( )-orientation are grown on c-sapphire at 850–1050°C by hydride vapor phase epitaxy. High-resolution x-ray diffraction shows that pure β-Ga2O3 with a smooth surface has a higher crystal quality, and the Raman spectra reveal a very small residual strain in β-Ga2O3 grown by hydride vapor phase epitaxy compared with bulk single crystal. The optical transmittance is higher than 80% in the visible and near-UV regions, and the optical bandgap energy is calculated to be 4.9 eV.