Concepedia

Preparation of non-spherical silica composite abrasives by lanthanum ion-induced effect and its chemical–mechanical polishing properties on sapphire substrates

Yue Dong, Hong Lei, Wenqing Liu, Tianxian Wang, Lei Xu

Journal of Materials Science · 2018 · 26 citations · 26 references

DOI

Concepts

References

26

An ESCA study of the termination of the passivation of elemental metals

Tery L. Barr · The Journal of Physical Chemistry · 1978 · 882 citations

, , +6

Material removal mechanism in chemical mechanical polishing: theory and modeling

Jianfeng Luo, David Dornfeld · IEEE Transactions on Semiconductor Manufacturing · 2001 · 641 citations

, , +16

A micro-contact and wear model for chemical–mechanical polishing of silicon wafers

Yongwu Zhao, L. Chang · Wear · 2002 · 301 citations

, , +16

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

, , +9

A Model for Mechanical Wear and Abrasive Particle Adhesion during the Chemical Mechanical Polishing Process

Goodarz Ahmadi, Xun Xia · Journal of The Electrochemical Society · 2001 · 131 citations

, , +17