Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement - Concepedia

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Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

14

Citations

21

References

2018

Year

Bader Alharthi, Joshua M. Grant, Wei Dou, Perry C. Grant, Aboozar Mosleh, Wei Du, Mansour Mortazavi, Baohua Li, Hameed A. Naseem, Shui-Qing Yu

Journal of Electronic Materials

PhysicsRf Plasma EnhancementApplied PhysicsHeteroepitaxial GrowthSemiconductor Device FabricationVacuum DeviceSilicon On InsulatorEpitaxial GrowthChemical Vapor Deposition

References

	Year	Citations

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