Computational analysis and experimental evidence of two typical levelers for acid copper electroplating - Concepedia

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Computational analysis and experimental evidence of two typical levelers for acid copper electroplating

95

Citations

32

References

2018

Year

Zhiqiang Lai, Shouxu Wang, Chong Wang, Yan Hong, Yuanming Chen, Huaiwu Zhang, Guoyun Zhou, Wei He, Kehua Ai, Yongqiang Peng

Electrochimica Acta

Materials ScienceElectrometallurgyEngineeringComputational AnalysisAcid CopperElectrochemistryTypical Levelers

References

	Year	Citations

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