Publication | Closed Access
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
16
Citations
30
References
2018
Year
Materials EngineeringMaterials ScienceSemiconductor TechnologySequential ExposuresEngineeringBoron NitrideHexagonal Boron NitrideApplied PhysicsAmorphous Solid
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