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Surface morphology evolution and optoelectronic properties of heteroepitaxial Si-doped β-Ga2O3 thin films grown by metal-organic chemical vapor deposition

Oxide HeterostructuresMaterials ScienceEngineeringSurface Morphology EvolutionOptoelectronic PropertiesOptoelectronic MaterialsSurface ScienceApplied PhysicsGallium OxideOptoelectronic DevicesThin Film Process TechnologyThin FilmsEpitaxial GrowthChemical Vapor DepositionThin Film Processing