Exponential fringe pattern projection approach to gamma-independent phase computation without calibration for gamma nonlinearity in 3D optical metrology

Abstract

This paper presents a method that expresses the fringe pattern as an exponential function and a mathematical model for gamma-independent phase computation. The method was compared to: (i) conventional phase measurement without nonlinearity correction, and (ii) conventional gamma correction by pattern pre-distortion based on an input-to-projector camera-output look-up table. The pre-distorted and exponential methods achieved large reduction in error compared to conventional computation with no gamma correction. The advantage of the exponential method is that no system gamma nonlinearity calibration procedure or information is required. This reduces optical system setup before measurement and permits easier use of off-the-shelf projectors.