Influence of gas pressure on electron beam emission current of pulsed cathodic-arc-based forevacuum plasma electron source

Abstract

We describe our experimental investigation of the effect of background gas pressure on the emission parameters of a pulsed cathodic-arc-based forevacuum-pressure plasma-cathode electron source. We find that increased gas pressure over the range 4–16 Pa significantly reduces the beam current rise-time and significantly increases the emission current amplitude. For example, at a discharge current of 20 A, increasing the working gas pressure from 4 Pa to 16 Pa increases the emission current from 8 A to 18 A and shortens the beam rise-time from 50 μs to 20 μs. This influence of gas pressure on the electron beam parameters can be explained by the effect of arc discharge current switching from the anode to emission. In our case, the current switching effect is caused by increased working gas pressure. In the forevacuum pressure range, the increase of the electron emission current with the growth of gas pressure is due to a rise in the emission plasma potential which is caused by ion back-streaming from the plasma formed in the electron beam transport region. A model describing the influence of gas pressure on the electron emission from the plasma is presented.