Publication | Closed Access
Experimental study of the effects of showerhead configuration on large-area silicon-nitride thin film by plasma-enhanced chemical vapor deposition
12
Citations
24
References
2017
Year
EngineeringMicrofabricationSurface ScienceApplied PhysicsShowerhead ConfigurationExperimental StudyChemical DepositionSilicon On InsulatorPlasma ProcessingPlasma EtchingChemical Vapor Deposition
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