Semiconductor Science and Technology · 2016 · 146 citations · 73 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsNanotechnologySemiconductor DevicesCmos Circuit DesignDevice ScalingField-effect TransistorsIntegrated Circuit DesignNanoelectronicsNanowiresCmos Fabrication ProcessesCmos ScalingDevice OptimizationNanowire Field-effect TransistorsNanowire TransistorsReconfigurable CircuitsReconfigurationScaling Effects In Cmos
CMOS scaling is approaching its limits, prompting the need for new approaches that enable device‑level reconfigurability to build more complex systems with fewer devices, such as the reconfigurable field‑effect transistor (RFET) that can switch between n‑channel and p‑channel behavior with minimal process changes. This paper reviews the fundamentals and current status of the RFET. The authors survey the state of the art in reconfigurable devices, introduce the RFET and related silicon‑nanowire technologies, discuss device optimization for symmetry and performance, demonstrate circuit implementations exploiting its unique advantages, and explore extensions to flexible devices, sensors, and More‑than‑Moore applications.
With CMOS scaling reaching the limits in the next decade, new approaches are required to enhance the functionality of electronic systems. Reconfigurability on the device level promises to realize more complex systems with a lower device count. In the last 5 years a number of interesting concepts have been proposed to realize such a device level reconfiguration. Among these the reconfigurable field effect transistor (RFET), a device that can be configured between an n-channel and p-channel behavior by applying an electrical signal, can be considered as an end of roadmap extension of current technology with only small modifications to the process flow [1]. This paper gives a review on the RFET basics and current status. In the first sections the state of the art of reconfigurable devices will be summarized [2] and the RFET will be introduced together with related devices based on silicon nanowire technology [3]. The device optimization with respect to device symmetry and performance will be discussed next [4,5]. The potential of the RFET device technology will then be shown by discussiing circuit implementations making use of the unique advantages of this device concept [6,7,8]. The basic device concept was also extended towards applications in flexible devices and sensors [9,10] extending the capabilities also towards so called More than Moore applications were new functionalities are implemented in CMOS base processes. Finally the prospects of the RFET device technology will be discussed.
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