GaN double ifeterojunction field effect transistor for microwave and millimeterwave power applications

Abstract

We report development of a novel AlGaN/GaN/AlGaN double heterojunction field effect tansistor (DHFET) with improved device performance over the conventional single heterojunction GaN FET (SHFET). The GaN DHFETs with low Al content Al/sub 0.04/Ga/sub 0.96/N buffer layer exhibit three orders of magnitude lower subthreshold drain leakage current and almost three orders of magnitude higher buffer isolation than corresponding SHFET devices (600 M/spl Omega//sq. vs. 1 M/spl Omega//sq.). In GaN DHFET's with 0.15 /spl mu/m conventional T-gates we observed 30% improvement in saturated power density and 10% improvement in PAE at 10 GHz over a corresponding SHFET device.