Publication | Open Access

Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors

Photonic DevicePhotonicsElectrical EngineeringWafer Scale ProcessingEngineeringOptical PropertiesApplied PhysicsSilicon Photonics DevicesPhotonic Integrated CircuitRecord Low LossAdvanced 300-Mm WaferscaleMicroelectronicsMicrowave PhotonicsOptoelectronicsProgrammable Photonics