Large Scale Uniformity of Sputtering Deposited Single- and Few-Layer MoS₂Investigated by XPS Multipoint Measurements and Histogram Analysis of Optical Contrast

Abstract

Large scale uniformity of the single- and few-layer MoS2 fabricated by sputtering deposition and subsequential postdeposition sulfurization annealing were investigated by XPS multipoint measurements and histogram analysis of optical contrast, which are non-contact, non-destructive, and quantitative investigation. As a result, it was revealed that the thickness of the 1, 3, and 5L MoS2 were accurately controlled over a sub-cm scale. Moreover, it was confirmed that the results were correlated with the other existing thickness identification methods, such as cross-sectional TEM, AFM, and Raman spectroscopy.