Publication | Closed Access
Ferroelectricity in undoped-HfO<sub>2</sub> thin films induced by deposition temperature control during atomic layer deposition
207
Citations
39
References
2016
Year
Materials ScienceOxide HeterostructuresEngineeringFerroelectric ApplicationOxide ElectronicsSurface ScienceApplied PhysicsCondensed Matter PhysicsQuantum MaterialsThin Film Process TechnologyDeposition Temperature ControlThin FilmsEpitaxial GrowthDeposition TemperatureAtomic Layer DepositionThin Film Processing
The evolution of ferroelectricity in undoped-HfO<sub>2</sub> thin films is systematically studied by controlling the deposition temperature during atomic layer deposition.
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