Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering - Concepedia

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Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering

40

Citations

27

References

2016

Year

Ranran Su, Hongliang Zhang, D.J. O’Connor, Liqun Shi, Xiangpeng Meng, Haibin Zhang

Materials Letters

Materials ScienceEngineeringSurface ScienceApplied PhysicsMagnetron SputteringTi2alc Max PhaseTi3alc Thin FilmsMagnetic Thin FilmsThin FilmsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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