Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering - Concepedia

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Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering

245

Citations

37

References

2006

Year

O. Wilhelmsson, J.-P. Palmquist, Erik Lewin, Jens Emmerlich, Per Eklund, Per O. Å. Persson, Hans Högberg, S. Li, Rajeev Ahuja, Olle Eriksson,

Journal of Crystal Growth

Materials ScienceThin Film PhysicsEngineeringSurface ScienceApplied PhysicsDc MagnetronThin Film DevicesTernary Thin FilmsThin FilmsChemical DepositionTi–al–c SystemThin Film Process TechnologyChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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