Enhanced Absorption in Laser-Crystallized Silicon Thin Films on Textured Glass

Abstract

This paper reports enhanced absorption in laser-crystallized Si thin films on abrade-textured glass. The Si film on textured glass has large high-quality grains of several hundred micrometers in width and up to several centimeters in length. A combination of glass texturing, rear Si texturing, white paint rear reflector, and front moth-eye antireflection foil on a 10-μm-thick Si film (on <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX"> $\text{SiO}_{x}/\text{SiN}_{x}/\text{SiO}_{x}$</tex-math></inline-formula> intermediate layer) shows a large broadband absorption enhancement with potential short-circuit current densities up to 29.5 mA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> (26.1% enhancement as compared with a planar reference).