Publication | Closed Access
Observation of Surface Dirac Cone in High-Quality Ultrathin Epitaxial Bi<sub>2</sub>Se<sub>3</sub> Topological Insulator on AlN(0001) Dielectric
41
Citations
28
References
2014
Year
Materials ScienceOxide HeterostructuresSurface Dirac ConeEngineeringPhysicsCrystalline DefectsDirac ConeTopological InsulatorApplied PhysicsQuantum MaterialsCondensed Matter PhysicsTopological MaterialThin FilmsMolecular Beam EpitaxyEpitaxial GrowthBi2se3 Topological Insulators
Bi2Se3 topological insulators (TIs) are grown on AlN(0001)/Si(111) substrates by molecular beam epitaxy. In a one-step growth at optimum temperature of 300 °C, Bi2Se3 bonds strongly with AlN without forming interfacial reaction layers. This produces high epitaxial quality Bi2Se3 single crystals with a perfect registry with the substrate and abrupt interfaces, allowing thickness scaling down to three quintuple layers (QL) without jeopardizing film quality. It is found by angle-resolved photoelectron spectroscopy that, remarkably, Bi2Se3 films maintain the 3D TI properties at very low thickness of 3QL (∼2.88 nm), exhibiting top surface gapless metallic states in the form of a Dirac cone.
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