Study of Growth Parameters for Single InAs QD Formation on GaAs(001) Patterned Substrates by Local Oxidation Lithography

Jesús Herranz, L. González, Lukasz Jakub Wewior, Benito Alén, D. Fuster, Y. González

Crystal Growth & Design · 2014 · 10 citations · 28 references

DOIFull text

Open access

Concepts

Abstract

This work studies the selective nucleation of InAs within nanoholes on GaAs(001) substrates patterned by atomic force microscopy local oxidation. The effects of substrate temperature and As 4 overpressure during InAs deposition directly on the patterned substrate (without a GaAs buffer layer) are considered. It is found that when InAs is deposited at substrate temperature of 510 °C under low As 4 overpressure, a single InAs quantum dot per nanohole is obtained for a broad range of sizes of pattern motifs. The use of these InAs quantum dots as seed nuclei for vertical stacking of optically active single InAs site-controlled quantum dots is investigated.

References

28