UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100nm half-pitch wire grid polarizer - Concepedia

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UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100nm half-pitch wire grid polarizer

10

Citations

7

References

2016

Year

Florian Schlachter, Julian Barnett, Ulrich Plachetka, Christoph Nowak, Martin Messerschmidt, Manuel W. Thesen, H. Kurz

Microelectronic Engineering

Materials ScienceAluminium NitrideEngineeringNanomaterialsNanotechnologyApplied PhysicsNanolithography Method

References

	Year	Citations

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