Martin Messerschmidt

Author

Micro Resist Technology (Germany)

Also Known As

M. Messerschmidt, Martin Messerschmidt, Messerschmidt, Martin

Publications

617

Citations

H-Index

Concepts

All Affiliations

Micro Resist Technology (Germany)Leibniz Institute of Polymer Research Technische Universität Dresden AMO (Germany)

About

Martin Messerschmidt is an author at Micro Resist Technology (Germany) specializing in engineering, polymer chemistry, and polymer science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	447
2	Biomolecular Engineering	3	3	384
3	Applied Physics	2	2	22
4	Natural Sciences	1	1	324
5	Biochemistry	1	1	324

Martin Messerschmidt

Publications

531

Citations

H-Index

Page 1

	Year	Citations
Orthogonal Approaches to the Simultaneous and Cascade Functionalization of Macromolecules Using Click Chemistry Michael Malkoch, Raymond J. Thibault, Éric Drockenmuller, Journal of the American Chemical Society EngineeringOrganic ChemistryVinyl PolymersChemistryClick Chemistry	2005	324
Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers Arne Schleunitz, Vitaliy A. Guzenko, Martin Messerschmidt, Nano Convergence	2014	63
New Photolabile Functional Polymers for Patterning onto Gold Obtained by Click Chemistry B. Sieczkowska, Marta Millaruelo, Martin Messerschmidt, Macromolecules EngineeringResponsive PolymersSynthetic PhotochemistryClick ChemistryChemistry	2007	43
Synthesis of Partially Protected Block Copolymers Based on 4-Hydroxystyrene Using NMRP and a Sequence of Polymer Analogous Reactions Martin Messerschmidt, M. Millaruelo, Hartmut Komber, Macromolecules Materials ScienceChemical EngineeringBlock Co-polymersEngineeringPolymer Hybrid	2008	22
A novel method for the synthesis of alkoxyamine initiators for nitroxide-mediated radical polymerization using Mn(OAc)3 as electron-transfer reagent Tilo Krause, Wolf D. Habicher, Martin Messerschmidt, Designed Monomers & Polymers Radical PolymerizationFavorable MnEngineeringAlkoxyamine InitiatorsOrganic Chemistry	2004	19
Nitroxide‐mediated homo‐ and block copolymerization of styrene and multifunctional acryl‐ and methacryl derivatives Meizhen Yin, Tilo Krause, Martin Messerschmidt, Journal of Polymer Science Part A Polymer Chemistry Macromolecular ChemistryEngineeringPolystyrene MacroinitiatorOrganic ChemistryChemistry	2005	17
New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps Martin Messerschmidt, Andrew I. M. Greer, Florian Schlachter, Journal of Photopolymer Science and Technology EngineeringElectron-beam LithographyPolymer NanotechnologyNew Nil ResistApplied Polydimethyl Siloxane	2017	12
Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems Thomas Handte, Nicolas Scheller, Lars Dittrich, Micro and Nano Engineering	2022	11
UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100nm half-pitch wire grid polarizer Florian Schlachter, Julian Barnett, Ulrich Plachetka, Microelectronic Engineering Materials ScienceAluminium NitrideEngineeringNanomaterialsNanotechnology	2016	10
Fluorocarbon-Free Dual-Action Textile Finishes Based on Covalently Attached Thermoresponsive Block Copolymer Brush Coatings Martin Messerschmidt, Andreas Janke, Frank Simon, ACS Applied Materials & Interfaces	2018	10

Page 1