Rapid formation of regulated methacrylate networks yielding tough materials for lithography-based 3D printing

Abstract

Vinyl sulfone esters are described as a new class of AFCT reagents for methacrylate-based photopolymerization without the drawback of retardation but good regulation of network architecture. Resulting materials show low shrinkage stress and increased toughness. This paves the way for vinyl sulfone esters in lithography-based 3D printing.