Electronics Letters · 2000 · 20 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsLaser DiodesLaser PhysicsPhotonic Integrated CircuitsQuantum OptoelectronicsQuantum Well DevicesSemiconductor LasersActive Region MorphologyDeep Reactive Ion EtchingDistributed Feedback LasersEtchingLasersLow-threshold Current LasersQuantum Well LasersReactive Ion Etching
Very low threshold 1.5 µm-wavelength GaInAsP/InP distributed feedback lasers consisting of deeply etched double quantum-well wire-like active regions have been successfully realised by CH4/H2 reactive ion etching and metal organic vapour phase epitaxial regrowth. A threshold current density Jth of as low as 94 A/cm2 was achieved for an active region width of 115 nm and cavity length of 600 µm.
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Nobuhiro Nunoya, Madoka Nakamura, H. Yasumoto et al. · Japanese Journal of Applied Physics · 1999 · 22 citations
Very low threshold current density GSMBE 1.55 µmgain-coupled DFB lasers
N. Aberkane, B. Thédrez, J.L. Gentner et al. · Electronics Letters · 1998 · 19 citations