Concepedia

Influence of HPPMS pulse parameters on the reactive gas N2 and on the properties of (Cr, Al)N coatings

Kirsten Bobzin, T. Brögelmann, Ricardo H. Brugnara, N.C. Kruppe, S. Chromý

Surface and Coatings Technology · 2015 · 22 citations · 19 references

DOI

Concepts

References

19

High power impulse magnetron sputtering discharge

N. Brenning, Daniel Lundin, Ulf Helmersson · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 741 citations · Full text

, , +14

Probe diagnostics of non-Maxwellian plasmas

Valery Godyak, R. B. Piejak, B. M. Alexandrovich · Journal of Applied Physics · 1993 · 305 citations

, , +13

An introduction to thin film processing using high-power impulse magnetron sputtering

Daniel Lundin, Kostas Sarakinos · Journal of materials research/Pratt's guide to venture capital sources · 2012 · 297 citations · Full text

, , +10

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

K. Macák, V. Kouznetsov, Jochen M. Schneider et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 275 citations

, , +17

Oxidation resistance of Cr1−XAlXN and Ti1−XAlXN films

Masahiro Kawate, Ayako Hashimoto, Tetsuya Suzuki · Surface and Coatings Technology · 2002 · 256 citations

, , +14