Low-Pressure Deposition of TiN Thin Films from a Tetrakis(dimethylamido)titanium Precursor

Abstract

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTLow-Pressure Deposition of TiN Thin Films from a Tetrakis(dimethylamido)titanium PrecursorC. M. Truong, P. J. Chen, J. S. Corneille, W. S. Oh, and D. W. GoodmanCite this: J. Phys. Chem. 1995, 99, 21, 8831–8842Publication Date (Print):May 1, 1995Publication History Published online1 May 2002Published inissue 1 May 1995https://pubs.acs.org/doi/10.1021/j100021a059https://doi.org/10.1021/j100021a059research-articleACS PublicationsRequest reuse permissionsArticle Views301Altmetric-Citations45LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access options Get e-Alerts