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Domain structure and electrical properties of highly textured PbZr_<i>x</i>Ti_1−<i>x</i>O₃ thin films grown on LaNiO₃-electrode-buffered Si by metalorganic chemical vapor deposition

Materials ScienceElectrical EngineeringEngineeringElectronic MaterialsSurface ScienceApplied PhysicsQuantum MaterialsSemiconductor MaterialThin Film Process TechnologyThin FilmsDomain StructureEpitaxial GrowthElectrical PropertiesThin Film Processing