Fabrication of semiconducting YBaCuO surface-micromachined bolometer arrays

Abstract

Thermal infrared detectors require thermal isolation to permit the infrared-sensitive material to integrate the incident photon energy and thereby obtain high responsivity and detectivity. This paper describes the fabrication of semiconducting YBaCuO microbolometer arrays into thermal isolation structures by employing Si surface-micromachining techniques. An isotropic HF:HNO/sub 3/ etch was used to remove the underlying Si substrate from the front-side of the wafer and suspend SiO/sub 2/ membranes into 1/spl times/10 pixel-array structures. The infrared-sensitive material, YBaCuO, was subsequently deposited onto the thermal isolation structures and patterned to form the detector arrays. The high-temperature coefficient of resistance and low noise of semiconducting YBaCuO at room temperature is attractive for uncooled infrared detection. The fabrication process was conducted entirely at room temperature. In this manner, infrared detectors are fabricated in a process that is compatible with CMOS technology to allow for the integration with on-chip signal processing circuitry. The end result is low-cost infrared-detector arrays for night vision in a variety of applications including transportation and security. Preliminary results show a temperature coefficient of resistance above 3%, voltage responsivity close to 10/sup 4/ V/W, and detectivity over 10/sup 7/ cm/spl middot/Hz/sup 1/2//W at a bias current of 0.79 /spl mu/A.