Publication | Closed Access
Nanoscale phase changes in crystalline Ge2Sb2Te5 films using scanning probe microscopes
86
Citations
15
References
2006
Year
EngineeringCrystal Growth TechnologyAfm MarkNanoscale Amorphous MarksNanometrologyNanoscale ScienceEpitaxial GrowthMaterials ScienceCrystalline DefectsPhysicsNanotechnologyCrystalline Ge2sb2te5 FilmsMaterial AnalysisNanomaterialsScanning Probe MicroscopySurface ScienceApplied PhysicsScanning Force MicroscopyProbe MicroscopesNanofabricationThin FilmsNanoscale Phase ChangesAmorphous Solid
Nanoscale amorphous marks have been produced in crystalline Ge2Sb2Te5 films using an atomic-force microscope (AFM) and a scanning-tunneling microscope (STM) through electrical phase changes. Voltage pulses with duration of 5–100 ns applied by metal probes of the AFM and the STM can produce, respectively, high-resistance regions and deformations, the smallest sizes being ∼10 and ∼100 nm in diameter. Raman-scattering spectra demonstrate that these marks are amorphous. The AFM mark can be erased by applying longer pulses. Formation processes of the marks are considered from electrothermal and thermodynamic aspects.
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