Rotational symmetry field design on surfaces

Abstract

Designing rotational symmetries on surfaces is a necessary task for a wide variety of graphics applications, such as surface parameterization and remeshing, painterly rendering and pen-and-ink sketching, and texture synthesis. In these applications, the topology of a rotational symmetry field such as singularities and separatrices can have a direct impact on the quality of the results. In this paper, we present a design system that provides control over the topology of rotational symmetry fields on surfaces.