EFFECT OF SUBSTRATE TEMPERATURE ON GROWTH OF NITROGEN INCORPORATED CAMPHORIC CARBON FILMS BY PULSED LASER ABLATION

Abstract

gas ambient with varying substrate temperature from 20°C to 500°C. The effects of the substrate temperature and ambient nitrogen gas pressure on the surface morphology, composition, structure, and electrical properties of the nitrogen incorporated camphoric carbon thin films have been investigated by standard techniques. We found that the amorphous structure of CN x films can be changed by substrate temperature and the CN x films with high nitrogen content have relatively high electrical resistivity.