An accurate determination of the K‐shell X‐ray fluorescence yield of silicon

Abstract

A measurement of the K‐shell fluorescence yield of silicon is undertaken in which identified sources of systematic errors in previous measurements are reduced or eliminated. This enables a stringent test of the only two sets of theoretical predictions available for atomic numbers less than 18. Our result ω K = 0.0495 ± 0.0015 is very slightly lower than the non‐relativistic Hartree‐Fock‐Slater (HFS) prediction of 0.0514. This stringent test of the HFS predictions helps to refine the fundamental parameter database of the X‐ray fluorescence analysis technique, whose importance for light elements is increasing. Our work indicates the need for new theoretical calculations of K‐shell fluorescence yields for these elements. Copyright © 2012 John Wiley & Sons, Ltd.