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Drain-Induced Barrier Lowering and Parasitic Resistance Induced Instabilities in Short-Channel InSnZnO TFTs
48
Citations
15
References
2014
Year
EngineeringShort-channel Insnzno TftsThin Film Process TechnologyCharge TransportSemiconductor DeviceElectronic DevicesNanoelectronicsDrain-induced Barrier LoweringCharge Carrier TransportSemiconductor TechnologyElectrical EngineeringPhysicsBarrier LoweringBias Temperature InstabilityInsnzno-based Thin-film TransistorsMicroelectronicsApplied PhysicsShort-channel Induced InstabilitiesThin Films
Effect of short-channel induced instabilities in InSnZnO-based thin-film transistors (TFTs) caused by combination of the drain induced barrier lowering (DIBL) and parasitic resistance is reported. As the active channel length decreased below a critical value of around 8 μm, the draincurrent (2.81 μA) are abruptly increased and N-shaped behavior of the transconductance are observed due to the formation of additional current path in the channel. The magnitude of subgap density of states is also depended on the channel size. The higher value of parasitic resistance RSD (~42 kg) and DIBL coefficient (76.8 mV/V) in short-channel ITZO TFT devices are also discussed.
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