Publication | Closed Access
Impact of gate workfunction on device performance at the 50 nm technology node
187
Citations
5
References
2000
Year
Hardware SecurityGate WorkfunctionElectrical EngineeringNm Technology NodeEngineeringVlsi DesignTechnology ScalingNanoelectronicsBias Temperature InstabilityApplied PhysicsDevice PerformanceMicroelectronicsSemiconductor Device
| Year | Citations | |
|---|---|---|
Page 1
Page 1