Tantalum and Tantalum Nitride as Diffusion Barriers Between Copper and Silicon - Concepedia

Concepedia

Publication | Closed Access

Tantalum and Tantalum Nitride as Diffusion Barriers Between Copper and Silicon

12

Citations

8

References

1990

Year

Karen Holloway, P. M. Fryer

MRS Proceedings

Materials EngineeringMaterials ScienceEngineeringDiffusion ResistanceSurface ScienceApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationSilicon On InsulatorTantalum Nitride

References

	Year	Citations

Page 1