Atomic scale memory at a silicon surface

Roland Bennewitz, Jason Crain, J-L Lin, J. L. McChesney, Dmitri Y. Petrovykh, F. J. Himpsel

Nanotechnology · 2002 · 115 citations · 26 references

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Concepts

TL;DR

The limits of pushing storage density to the atomic scale are explored with a memory that stores a bit by the presence or absence of one silicon atom. The memory uses silicon atoms positioned at lattice sites along self‑assembled tracks spaced five atom rows apart, which can be initialized and re‑formatted by controlled silicon deposition, and written by transferring atoms to the tip of a scanning tunnelling microscope. The constraints on speed and reliability are compared with data storage in magnetic hard disks and DNA.

Abstract

The limits of pushing storage density to the atomic scale are explored with a memory that stores a bit by the presence or absence of one silicon atom. These atoms are positioned at lattice sites along self-assembled tracks with a pitch of five atom rows. The memory can be initialized and reformatted by controlled deposition of silicon. The writing process involves the transfer of Si atoms to the tip of a scanning tunnelling microscope. The constraints on speed and reliability are compared with data storage in magnetic hard disks and DNA.

References

26