IEEE Transactions on Electron Devices · 1991 · 70 citations · 10 references
Numerical AnalysisDevice ModelingElectrical EngineeringSemiconductor DeviceEngineeringHigh Voltage EngineeringBias Temperature InstabilityN-channel IgbtsPower Semiconductor DeviceSingle Event EffectsDestructive FailureWide Base TransistorPower ElectronicsPower SemiconductorsCircuit AnalysisCircuit SimulationN-channel Igbt
The mechanisms of destructive failure of an insulated gate bipolar transistor (IGBT) at short-circuit state are discussed. Results from two-dimensional numerical simulation of p-channel and n-channel IGBTs are presented. It is found that there are two types of destructive failure mechanisms: a secondary breakdown and a latchup. Which type is dominant in p-channel and n-channel IGBTs depends on an absolute value of forward voltage mod V/sub CE/ mod . At moderately low mod V/sub CE/ mod , the p-channel IGBT is destroyed by secondary breakdown, and the n-channel IGBT, by latchup. This is due to the difference of a type of flowing carrier crossing a base-collector junction of wide base transistor and ionization rates of electrons and holes.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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The COMFET—A new high conductance MOS-gated device
John P. Russell, Alvin M. Goodman, L.A. Goodman et al. · IEEE Electron Device Letters · 1983 · 201 citations
Semiconductors, N-channel Power Mosfet, Electrical Engineering +11
The insulated gate rectifier (IGR): A new power switching device
B. Jayant Baliga, M.S. Adler, P. Gray et al. · 1982 · 199 citations
Electrical Engineering, Engineering, Insulated Gate Rectifier +12