High‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies

Abstract

Making a good impression: Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high-resolution (<100 nm) pattern transfer and imprint lithographic processes (see pictures). PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity, resist swelling by organic solvents, and endure repetitive molding procedures.