IEEE Electron Device Letters · 1992 · 74 citations · 9 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsBipolar Junction TransistorsComplementary Metal-oxide-semiconductor TechnologyDopingSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsCharge Carrier RecombinationCharge RecombinationCurrent GainDoping Effects On Device PerformanceGainGain EnhancementHeterojunction Bipolar TransistorsJunction Ideality Factor
GaInP/GaAs heterojunction bipolar transistors (HBTs) have been fabricated and these devices exhibit near-ideal I-V characteristics with very small magnitudes of the base-emitter junction space-charge recombination current. Measured current gains in both 6- mu m*6- mu m and 100- mu m*100- mu m devices remain constant for five decades of collector current and are greater than unity at ultrasmall current densities on the order of 1*10/sup -6/ A/cm/sup 2/. For the 6- mu m*6- mu m device, the current gain reaches a high value of 190 at higher current levels. These device characteristics are also compared to published data of an abrupt AlGaAs/GaAs HBT having a base layer with similar doping level and thickness.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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High speed semiconductor devices
III-Vs Review · 1991 · 533 citations
Engineering, Computer Engineering, Electrical Engineering +12
Takashi Kobayashi, K. Taira, Fumihiko Nakamura et al. · Journal of Applied Physics · 1989 · 166 citations
Material properties of <i>p</i>-type GaAs at large dopings
Sandip Tiwari, Steven L. Wright · Applied Physics Letters · 1990 · 109 citations · Full text